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A combinatorial analysis of deposition parameters on deposition process and performance of silicon thin films by VHF-PECVD

✍ Scribed by Hou, Guofu ;Mai, Yaohua ;Xue, Junming ;Zhao, Ying ;Zhang, Xiaodan ;Ren, Huizhi ;Zhang, Dekun ;Sun, Jian ;Geng, Xinhua

Book ID: 105362477
Publisher: John Wiley and Sons
Year: 2003
Tongue: English
Weight: 127 KB
Volume: 199
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.200306658

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