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A combinatorial analysis of deposition parameters and substrates on performance of μc-Si:H thin films by VHF-PECVD

✍ Scribed by Xiao-dan Zhang; Ying Zhao; Feng Zhu; Chang-chun Wei; Chun-ya Wu; Yan-tao Gao; Jian Sun; Guo-fu Hou; Xin-hua Geng; Shao-zhen Xiong


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
307 KB
Volume
245
Category
Article
ISSN
0169-4332

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