𝔖 Bobbio Scriptorium

✦ LIBER ✦

Use of a PECVD–PVD process for the deposition of copper containing organosilicon thin films on steel

✍ Scribed by A. Daniel; C. Le Pen; C. Archambeau; F. Reniers

Book ID: 108063970
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 263 KB
Volume: 256
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2009.04.195

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The formation of a dual-layer carbon fil

The formation of a dual-layer carbon film on silicon carbide using a combination of carbide-derived carbon process and chemical vapor deposition in a CCl4 – containing atmosphere

✍ Jian Sui; Jinjun Lu 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 838 KB

Characterization of a chromium-gold depo

Characterization of a chromium-gold deposition process for the production of thin film hybrid microcircuits : F. A. Clay, N. T. Panousis and R. W. Pierce Jr., IEEE Trans. on Parts Hybrids and Packaging. PHP-10, 258 (1974)

📂 Article 📅 1975 🏛 Elsevier Science 🌐 English ⚖ 132 KB