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The formation of a dual-layer carbon film on silicon carbide using a combination of carbide-derived carbon process and chemical vapor deposition in a CCl4 – containing atmosphere

✍ Scribed by Jian Sui; Jinjun Lu


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
838 KB
Volume
49
Category
Article
ISSN
0008-6223

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