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Characterization of nitrogen-doped a-C:H films deposited by cathodic-arc activated deposition process

โœ Scribed by Chang, Yin-Yu; Wang, Da-Yung; Wu, WeiTe


Book ID
123001893
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
643 KB
Volume
12
Category
Article
ISSN
0925-9635

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Cr-doped TiO 2 thin films were prepared by co-sputtering of titanium and chromium in a cathodic arc plasma evaporation system. X-ray diffraction (XRD), Auger electron spectroscopy (AES), field emission scanning electron microscopy (FE-SEM), and water contact angle measurement were used to characteri