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Deposition rate and thickness uniformity of thin films deposited by a pulsed cathodic arc process

✍ Scribed by H Fuchs; B Engers; E Hettkamp; H Mecke; J Schultz

Book ID
108422879
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
283 KB
Volume
142-144
Category
Article
ISSN
0257-8972

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