Thin films of Zr-O/Al-O were deposited on SKD 11 tool steel substrate using Zr and Al cathodes in a cathodic arc plasma deposition system. The substrates were mounted on a rotating holder which alternatively exposed them to plasma from the two cathodes. The influence of the Zr and Al cathode arc cur
Characterization of Cr-doped TiO2 thin films prepared by cathodic arc plasma deposition
β Scribed by Mu-Hsuan Chan; Wei-Yu Ho; Da-Yung Wang; Fu-Hsing Lu
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 621 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0257-8972
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β¦ Synopsis
Cr-doped TiO 2 thin films were prepared by co-sputtering of titanium and chromium in a cathodic arc plasma evaporation system. X-ray diffraction (XRD), Auger electron spectroscopy (AES), field emission scanning electron microscopy (FE-SEM), and water contact angle measurement were used to characterize obtained films. As-deposited pure titanium dioxide thin films possessed a mostly anatase structure while Cr-doped TiO 2 films was amorphous. After annealing at 450 Β°C for 3 h, amorphous Cr-doped TiO 2 films transformed to a mixed anatase (mostly) and rutile phase. Changes in the morphology and composition of the films were examined by FE-SEM and AES. Crystalline Cr-doped TiO 2 films became super-hydrophilic after 20 min of exposure under visible light illumination, indicating that the absorption edge shifted from an ultraviolet region for TiO 2 to a visible light range for annealed Cr-doped TiO 2 films, which is further confirmed by UV-visible spectra.
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