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Radiation stability of EUV Mo/Si multilayer mirrors

✍ Scribed by Nicolas Benoit; Sergiy Yulin; Torsten Feigl; Norbert Kaiser

Book ID
108238687
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
268 KB
Volume
357
Category
Article
ISSN
0921-4526

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## Abstract Combined approach based on X‐ray reflectometry (XRR), atomic‐force microscopy (AFM), and small‐angle X‐ray scattering (SAXS) has been applied to two series of multilayer Mo/Si mirrors grown by magnetron sputtering on standard and specially smoothed substrates under different technologic