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Radiation-induced charge trapping in thin Al/sub 2/O/sub 3/SiO/sub x/N/sub y/Si[100] gate dielectric stacks

✍ Scribed by Felix, J.A.; Shaneyfelt, M.R.; Fleetwood, D.M.; Meisenheimer, T.L.; Schwank, J.R.; Schrimpf, R.D.; Dodd, P.E.; Gusev, E.P.; D'Emic, C.

Book ID: 121329294
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 588 KB
Volume: 50
Category: Article
ISSN: 0018-9499
DOI: 10.1109/TNS.2003.820763

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