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Punchthrough limits in MOS devices

โœ Scribed by K.Y. Tong


Book ID
104157568
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
363 KB
Volume
18
Category
Article
ISSN
0026-2692

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โœฆ Synopsis


A two-dimensional analytical model has been developed to predict the minimum channel length of a MOST when punchthrough just starts to occur. Our model shows the dependence of the minimum channel length on all device parameters and biasing voltages, and is verified by numerical simulation results. It can be applied to more flexible scaling of MOS devices using punchthrough as the fundamental limit. Our calculations for the minimum channel length compare favourably with reported process parameters.


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