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Pulsed microwave plasma etching of polymers in oxygen and nitrogen for microelectronic applications

✍ Scribed by Lin, T.H.; Belser, M.; Tzeng, Y.

Book ID: 117862093
Publisher: IEEE
Year: 1988
Tongue: English
Weight: 614 KB
Volume: 16
Category: Article
ISSN: 0093-3813
DOI: 10.1109/27.16551

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