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Plasma etching and patterning of CVD diamond at <100°C for microelectronics applications

✍ Scribed by R. Ramesham; W. Welch; W.C. Neely; M.F. Rose; R.F. Askew

Book ID
108389155
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
834 KB
Volume
304
Category
Article
ISSN
0040-6090

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