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The effect of polymer modification on microwave digestion efficiency, thermal stability and plasma etching resistance for the photoresist

✍ Scribed by Ko, Fu-Hsiang; Lu, June-Kuen; Chu, Tieh-Chi; Chou, Cheng-Tung; Hsiao, Li-Tung; Lin, Horng-Chih


Book ID
115499149
Publisher
Royal Society of Chemistry
Year
2000
Tongue
English
Weight
105 KB
Volume
15
Category
Article
ISSN
0267-9477

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