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Properties of Vanadium Oxide Films Prepared by DC Reactive Magnetron Sputtering at Different Oxygen Partial Pressures

✍ Scribed by Huang, Ren Gui; Zhang, Dong Ping; Zhang, Ting; Li, Yan; Chen, You Tong; Zhong, Yong Lin; Fan, Ping


Book ID
121860216
Publisher
Trans Tech Publications, Ltd.
Year
2012
Tongue
English
Weight
330 KB
Volume
538-541
Category
Article
ISSN
1662-8958

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The nanocrystal thin films of zinc oxide doped by Al (ZnO:Al) were deposited by dc reactive magnetron sputtering on the glass substrates, in the pressure range of 33-51 Pa. From the X-ray diffraction patterns, the nanocrystalline structure of ZnO:Al films and the grain size were determined. The opti