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Properties of silicon implanted with boron ions through thermal silicon dioxide

✍ Scribed by L.-O. Bauer; M.R. Macpherson; A.T. Robinson; H.G. Dill


Book ID
107856017
Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
845 KB
Volume
16
Category
Article
ISSN
0038-1101

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