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Properties of silicon implanted with boron ions through thermal silicon dioxide : L. O. Bauer, M. R. Macpherson, A. T. Robinson and H. G. Dill. Solid St. Electron.16 (1973), p. 289


Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
105 KB
Volume
12
Category
Article
ISSN
0026-2714

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