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Boron implanted in silicon: Segregation at angular configurations of the silicon/silicon dioxide oxidation boundary

✍ Scribed by G. A. Tarnavsky; S. I. Shpak; M. S. Obrecht

Book ID: 110127400
Publisher: SP MAIK Nauka/Interperiodica
Year: 2001
Tongue: English
Weight: 117 KB
Volume: 73
Category: Article
ISSN: 0021-3640
DOI: 10.1134/1.1385661

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