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Properties of ion implanted epitaxial CoSi2/Si(1 0 0) after rapid thermal oxidation

✍ Scribed by Q.T Zhao; P Kluth; J Xu; L Kappius; U Zastrow; Z.L Wang; S Mantl

No coin nor oath required. For personal study only.

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Properties of ion implanted epitaxial CoSi2/Si(1&#xa0;0&#xa0;0) after rapid thermal oxidation