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Interface properties of the Si(1 0 0)–SiO2 system formed by rapid thermal oxidation

✍ Scribed by B.J O’Sullivan; P.K Hurley; A Mathewson; J.H Das; A.D Daniel

No coin nor oath required. For personal study only.

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Interface properties of the Si(1&#xa0;0&#xa0;0)–SiO2 system formed by rapid thermal oxidation