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Properties of dc magnetron sputtered Cu2O films prepared at different sputtering pressures

✍ Scribed by A. Sivasankar Reddy; S. Uthanna; P. Sreedhara Reddy

Book ID
108060133
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
863 KB
Volume
253
Category
Article
ISSN
0169-4332

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The nanocrystal thin films of zinc oxide doped by Al (ZnO:Al) were deposited by dc reactive magnetron sputtering on the glass substrates, in the pressure range of 33-51 Pa. From the X-ray diffraction patterns, the nanocrystalline structure of ZnO:Al films and the grain size were determined. The opti