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Properties of carbon nitride thin films prepared by ion and vapor deposition

โœ Scribed by J.F.D. Chubaci; T. Sakai; T. Yamamoto; K. Ogata; A. Ebe; F. Fujimoto


Book ID
113284706
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
223 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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Silicon nitride (SiN x ) films were prepared by ion-assisted deposition process. The films were analyzed by measurement of scanning electron microscopy (SEM), Fourier transform infrared spectrometry (FTIR), Xray photoelectron spectrometry, spectrophotometer, and ellipsometer measurements. The effect