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Properties of amorphous and crystalline Ta[sub 2]O[sub 5] thin films deposited on Si from a Ta(OC[sub 2]H[sub 5])[sub 5] precursor

✍ Scribed by Chaneliere, C.; Four, S.; Autran, J. L.; Devine, R. A. B.; Sandler, N. P.

No coin nor oath required. For personal study only.

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