Production-ready dry cleaning and deposition processes for low-temperature Si and SiGe epitaxy

✍ Scribed by H.M. Buschbeck; A. Erhart; Y. Goeggel; C. Rosenblad; S. Wiltsche; J. Ramm; A. Dommann; M. Kummer

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 167 KB
• Volume: 224
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2003.08.087