✦ LIBER ✦
Low-temperature Si and Si: Ge epitaxy by ultrahigh-vacuum/chemical vapor deposition: process fundamentals : B. S. Meyerson. IBM J. Res. Dev.34(6), 806 (1990)
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 130 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0026-2714
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