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Process Control of Reactive Sputter Deposition of AlO $_{x}$ and Improved Surface Passivation of Crystalline Silicon

✍ Scribed by Zhang, Xinyu; Cuevas, Andres; Thomson, Andrew

Book ID: 121827893
Publisher: Institute of Electrical and Electronics Engineers
Year: 2013
Tongue: English
Weight: 814 KB
Volume: 3
Category: Article
ISSN: 2156-3381
DOI: 10.1109/JPHOTOV.2012.2214765

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