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Progress in Surface Passivation of Heavily Doped n-Type and p-Type Silicon by Plasma-Deposited AlO $_{\bm x}$/SiN$_{\bm x}$ Dielectric Stacks

✍ Scribed by Duttagupta, Shubham; Ma, Fa-Jun; Lin, Serena Fen; Mueller, Thomas; Aberle, Armin G.; Hoex, Bram


Book ID
121836456
Publisher
Institute of Electrical and Electronics Engineers
Year
2013
Tongue
English
Weight
523 KB
Volume
3
Category
Article
ISSN
2156-3381

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