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Process control of lateral autodoping in silicon epitaxy by measuring the sheet resistance

✍ Scribed by Dr. rer. nat. H. Kühne; R. Barth; W. Malze; Dr. rer. nat. H. Königsdörfer


Publisher
John Wiley and Sons
Year
1988
Tongue
English
Weight
414 KB
Volume
23
Category
Article
ISSN
0232-1300

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