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Process and Material Properties of HfLaO[sub x] Prepared by Atomic Layer Deposition

โœ Scribed by He, Wei; Chan, Daniel S. H.; Kim, Sun-Jung; Kim, Young-Sun; Kim, Sung-Tae; Cho, Byung Jin


Book ID
127065137
Publisher
The Electrochemical Society
Year
2008
Tongue
English
Weight
226 KB
Volume
155
Category
Article
ISSN
0013-4651

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