✦ LIBER ✦

PRIME process for deep UV and E-beam lithography

✍ Scribed by C. Pierrat; S. Tedesco; F. Vinet; T. Mourier; M. Lerme; B. Dal'Zotto; J.C. Guibert

Book ID: 103598179
Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 813 KB
Volume: 11
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(90)90160-u

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Hybrid deep UV–e-beam lithography for th

Hybrid deep UV–e-beam lithography for the fabrication of dual damascene structures

✍ L Mollard; S Tedesco; B Dal’zotto; V Jaubert; L Pain; G Fanget; C Comboroure; Y 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 480 KB

Polysiloxanes for deep UV lithography

✍ J.M. Shaw; M. Hatzakis; J. Parasczcak; E. Babich 📂 Article 📅 1985 🏛 Elsevier Science 🌐 English ⚖ 934 KB

Polysilanes: Photochemistry and deep UV

Polysilanes: Photochemistry and deep UV lithography

✍ R. D. Miller; G. Wallraff; N. Clecak; R. Sooriyakumaran; J. Michl; T. Karatsu; A 📂 Article 📅 1989 🏛 Society for Plastic Engineers 🌐 English ⚖ 497 KB

Chemistry and process for deep-UV resist

Chemistry and process for deep-UV resists

✍ E. Reichmanis; L.F. Thompson 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 577 KB

3D structures for UV-NIL template fabric

3D structures for UV-NIL template fabrication with grayscale e-beam lithography

✍ Guido Piaszenski; Ulrich Barth; Axel Rudzinski; Andreas Rampe; Andreas Fuchs; Ma 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 743 KB

Process latitude enhancement for 3D stru

Process latitude enhancement for 3D structure formation in e-beam lithography

✍ V.A. Kudryashov; V.V. Krasnov; P.D. Prewett; T.J. Hall 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 295 KB

Investigation of the positive resist dissolution process under low-energy e-bemn exposure has given rise to a new technology of 3D structure fonnation. This technology has a higher process latitude, which is of great hnportance for commercial prt~uction, and is cheap and e,xsy. Multilayer technologi