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Preparation of thin-film targets of chlorine

โœ Scribed by William K. Brooks


Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
260 KB
Volume
257
Category
Article
ISSN
0168-9002

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Preparation of aluminum thin films by th
โœ Toyoaki Hirata; Masao Nagakubo; Masahiko Naoe ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 383 KB

The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a