𝔖 Bobbio Scriptorium
✦   LIBER   ✦

CoCr thin film preparation by facing targets sputtering

✍ Scribed by Yoshiro Niimura; Shigeki Nakagawa; Masahiko Naoe

Publisher
Elsevier Science
Year
1988
Weight
331 KB
Volume
98
Category
Article
ISSN
0025-5416

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Preparation of aluminum thin films by th
Preparation of aluminum thin films by the facing targets sputtering system
✍ Toyoaki Hirata; Masao Nagakubo; Masahiko Naoe 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 383 KB

The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a

Preparation of piezoelectric ZnO thin fi
Preparation of piezoelectric ZnO thin films by target-facing-type sputtering method
✍ Ken-ya Hashimoto; Syotaro Ogawa; Akinori Nonoguchi; Tatsuya Omori; Masatsune Yam 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 231 KB 👁 1 views

This paper describes the deposition of high-quality zinc oxide (ZnO) thin film by reactive dc target-facing-type sputtering (DC-TFTS) using an arc killer that periodically applies a positive pulse to the negative dc discharge current. High-speed deposition of high-quality thin film, which is a merit