Preparation of the visible light responsive TiO2thin film photocatalysts by the RF magnetron sputtering deposition method
โ Scribed by Masato Takeuchi; Shiro Sakai; Masaya Matsuoka; Masakazu Anpo
- Publisher
- Springer Netherlands
- Year
- 2009
- Tongue
- English
- Weight
- 638 KB
- Volume
- 35
- Category
- Article
- ISSN
- 0922-6168
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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore
TiO 2 thin films were deposited on stainless steel substrates by radio frequency (RF) magnetron sputtering. The process conditions, including RF power, oxygen partial pressure, and temperature of substrate, were varied systematically. The deposited titanium dioxide films consisted of polycrystalline