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Preparation of silicon oxide films by ultraviolet-assisted rf plasma-enhanced chemical vapour deposition

✍ Scribed by A. HOZUMI; N. SUGIMOTO; H. SEKOGUCHI; O. TAKAI

Book ID: 110371945
Publisher: Springer
Year: 1997
Tongue: English
Weight: 230 KB
Volume: 16
Category: Article
ISSN: 0261-8028
DOI: 10.1023/a:1018507314842

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