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Preparation of Cu2O films on MgO (1 1 0) substrate by means of halide chemical vapor deposition under atmospheric pressure

✍ Scribed by Hiroki Kobayashi; Takato Nakamura; Naoyuki Takahashi

No coin nor oath required. For personal study only.

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Preparation of Cu2O films on MgO (1&#xa0;1&#xa0;0) substrate by means of halide chemical vapor deposition under atmospheric pressure