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Morphology variation in growth process of InN pillar crystal films on Si (1 0 0) substrate by halide chemical vapor deposition under atmospheric pressure

✍ Scribed by H. Sugiura; S. Wakasugi; H. Mizutani; T. Nakamura; N. Takahashi


Book ID
113782426
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
548 KB
Volume
108
Category
Article
ISSN
0254-0584

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