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Preparation and properties of reactive-sputtered amorphous CNx films

✍ Scribed by Naoyuki Takada; Kenta Arai; Shoji Nitta; Shuichi Nonomura


Book ID
108418390
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
351 KB
Volume
113-114
Category
Article
ISSN
0169-4332

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Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partia