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Preparation and properties of boron thin films

✍ Scribed by Kiichi Kamimura; Takeji Nagaoka; Toshio Shinomiya; Masato Nakao; Yoshiharu Onuma; Mika Makimura


Book ID
114086724
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
276 KB
Volume
343-344
Category
Article
ISSN
0040-6090

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Preparation and Properties of Boron Thin
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Boron thin films were prepared by plasma assisted chemical vapor deposition. The source gas was boron trichloride (BCl 3 ). Ring patterns of transmission electron beam diffraction indicated that films were polycrystalline -rhombohedral boron. Optical absorption edge was estimated from absorption spe

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Boron thin 5lms were deposited by electron beam evaporation and by pyrolysis of decaborane on quartz substrates. Re6ection electron beam di4raction was used to characterize the crystal structure. The amorphous structure was observed for the 5lm deposited by electron beam evaporation. The 5lm was pol

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Boron+silicon amorphous 5lms were prepared by pulsed laser deposition technique. Band gap was estimated from the optical absorption spectrum for the 5lms, and it increased with increasing silicon concentration. The values and concentration dependence of the band gap are nearly the same as those meas