Boron thin films were prepared by plasma assisted chemical vapor deposition. The source gas was boron trichloride (BCl 3 ). Ring patterns of transmission electron beam diffraction indicated that films were polycrystalline -rhombohedral boron. Optical absorption edge was estimated from absorption spe
Preparation and properties of boron thin films
β Scribed by Kiichi Kamimura; Takeji Nagaoka; Toshio Shinomiya; Masato Nakao; Yoshiharu Onuma; Mika Makimura
- Book ID
- 114086724
- Publisher
- Elsevier Science
- Year
- 1999
- Tongue
- English
- Weight
- 276 KB
- Volume
- 343-344
- Category
- Article
- ISSN
- 0040-6090
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