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Preparation and Properties of Amorphous Boron Nitride Films by Molecular Flow Chemical Vapor Deposition

✍ Scribed by Nakamura, Katsumitsu

Book ID
121413740
Publisher
The Electrochemical Society
Year
1985
Tongue
English
Weight
563 KB
Volume
132
Category
Article
ISSN
0013-4651

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## Abstract The kinetics of the CVD of boron nitride from trimethoxyborane (TMOB) and ammonia (NH~3~) under atmospheric pressure was investigated by varying the following process parameters: temperature, residence time of the reactants, molar fraction of TMOB, and the NH~3~/TMOB ratio, Ξ³. A kinetic