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Preparation and Properties of Amorphous Boron Films Deposited by Pyrolysis of Decaborane in the Molecular Flow Region

✍ Scribed by Nakamura, K.

Book ID
118131792
Publisher
The Electrochemical Society
Year
1984
Tongue
English
Weight
727 KB
Volume
131
Category
Article
ISSN
0013-4651

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Boron and boron phosphide films were prepared by gas source molecular beam deposition on sapphire crystal at various substrate temperatures up to 800Β°C using cracked B 2 H 6 (2% in H 2 ) at 300Β°C and cracked PH 3 (20% in H 2 ) at 900Β°C. The substrate temperatures and gas flow rates of the reactant g