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Effect of the hydrogen flow rate on the structural and optical properties of hydrogenated amorphous silicon thin films prepared by plasma enhanced chemical vapor deposition

✍ Scribed by Sana Ben Amor; Wissem Dimassi; Mohamed Ali Tebai; Hatem Ezzaouia


Book ID
115561648
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
387 KB
Volume
9
Category
Article
ISSN
1862-6351

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