๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Preparation and characterization of ZrF4-BaF2-EuF3 planar glass films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

โœ Scribed by Y. KAWAMOTO; R. KANNO; A. KONISHI


Book ID
111534461
Publisher
Springer
Year
1998
Tongue
English
Weight
171 KB
Volume
33
Category
Article
ISSN
0022-2461

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Wet etching studies of silicon nitride t
โœ K.B. Sundaram; R.E. Sah; H. Baumann; K. Balachandran; R.M. Todi ๐Ÿ“‚ Article ๐Ÿ“… 2003 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 194 KB

Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p