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Preparation and characterization of Nickel Oxide thin films by direct current reactive magnetron sputtering at different substrate temperatures

✍ Scribed by Reddy, A. Mallikarjuna; Byun, Chang Woo; Joo, Seung Ki; Reddy, A. Sivasankar; Reddy, P. Sreedhara


Book ID
127359732
Publisher
The Korean Institute of Metals and Materials
Year
2014
Tongue
English
Weight
502 KB
Volume
10
Category
Article
ISSN
1738-8090

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