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Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering

✍ Scribed by Sachin Thanawala; Daniel G. Georgiev; Ronald J. Baird; Gregory Auner

Book ID
108289647
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
791 KB
Volume
515
Category
Article
ISSN
0040-6090

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper