✦ LIBER ✦

Growth and characterization of chromium oxide coatings prepared by pulsed-direct current reactive unbalanced magnetron sputtering

✍ Scribed by Harish C. Barshilia; K.S. Rajam

Book ID: 108063746
Publisher: Elsevier Science
Year: 2008
Tongue: English
Weight: 879 KB
Volume: 255
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2008.08.057

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Growth and characterization of indium ox

Growth and characterization of indium oxide diodes prepared by reactive magnetron sputtering

✍ Lung-Chien Chen; Sien-Chang Liu 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 149 KB

Multi-technique characterization of tant

Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering

✍ S. Venkataraj; H. Kittur; R. Drese; M. Wuttig 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 808 KB

Characterization of Niobium Oxide Films

Characterization of Niobium Oxide Films Prepared by Reactive DC Magnetron Sputtering

✍ Venkataraj, S. ;Drese, R. ;Kappertz, O. ;Jayavel, R. ;Wuttig, M. 📂 Article 📅 2001 🏛 John Wiley and Sons 🌐 English ⚖ 190 KB 👁 2 views

Characterization of iridium oxide thin f

Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering

✍ Sachin Thanawala; Daniel G. Georgiev; Ronald J. Baird; Gregory Auner 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 791 KB

Deposition and characterization of nitro

Deposition and characterization of nitrogen containing stainless steel coatings prepared by reactive magnetron sputtering

✍ JM Schneider; C Rebholz; AA Voevodin; A Leyland; A Matthews 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 483 KB

Microstructure and mechanical properties

Microstructure and mechanical properties of Cr–Si–N coatings prepared by pulsed reactive dual magnetron sputtering

✍ M. Benkahoul; P. Robin; S.C. Gujrathi; L. Martinu; J.E. Klemberg-Sapieha 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 429 KB

Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si