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Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering

✍ Scribed by S. Venkataraj; H. Kittur; R. Drese; M. Wuttig

Book ID: 108289109
Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 808 KB
Volume: 514
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2005.08.320

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