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Preparation and characterization of nanostructured ZrO2 thin films by glancing angle deposition

โœ Scribed by Sumei Wang; Guodong Xia; Xiaoyong Fu; Hongbo He; Jianda Shao; Zhengxiu Fan

Book ID
108289477
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
344 KB
Volume
515
Category
Article
ISSN
0040-6090

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Glancing angle deposition (GLAD) was used to sculpt chromium thin films sputter deposited by dc magnetron sputtering into the desired zigzag microstructure. The flux angle of incident species ฮฑ was systematically varied from 0 to 50 โ€ข and periodically changed from ฮฑ to -ฮฑ. The total film thickness w