𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Characterization of ZrO2thin films deposited by MOCVD as ceramic coatings

✍ Scribed by A. M. Torres-Huerta; M. A. Domínguez-Crespo; E. Onofre-Bustamante; A. Flores-Vela

Book ID
106397075
Publisher
Springer
Year
2011
Tongue
English
Weight
958 KB
Volume
47
Category
Article
ISSN
0022-2461

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Role of the MOCVD deposition conditions
Role of the MOCVD deposition conditions on physico-chemical properties of tetragonal ZrO2 thin films
✍ K. Galicka-Fau; C. Legros; M. Andrieux; M. Brunet; J. Szade; G. Garry 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 926 KB

High-k ZrO 2 thin films suitable for microelectronics applications were deposited by DLI-MOCVD method on planar Si (1 0 0) and pores etched in Si (1 0 0). The effects of various experimental parameters such as temperature of substrates, injection frequency, concentration of the precursor and oxygen