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Predeposition plasma treatment of InSb surface in pecvd SiO2-InSb Structures

✍ Scribed by E.P. Valcheva; K.G. Germanova


Book ID
119124234
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
295 KB
Volume
7
Category
Article
ISSN
0167-577X

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SVSiO, srructures formed by thermal oxidation of n-type (1 IllSi and treated in an RF hydrogen plasma at temperatures ranging from 20 to 300Β°C were investigated. The plasma exposure led to annealing of postoxidation defects related to fixed positive oxide charges and interface stares but created int