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Studies on the structural properties of SiO:H films prepared from (SiH4+CO2+He) plasma in RF-PECVD

✍ Scribed by Arup Samanta; Debajyoti Das


Book ID
108265521
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
1008 KB
Volume
93
Category
Article
ISSN
0927-0248

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