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Precision surface temperature measurement and film characterization for LICVD of a-Si: H from SiH4

✍ Scribed by K. Hesch; P. Hess; H. Oetzmann; C. Schmidt

Book ID: 107925800
Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 410 KB
Volume: 36
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(89)90901-x

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